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Horizontal vacuum resistance furnaces are designed for carrying out various technological processes in high vacuum at temperatures up to 1600 degrees. The furnace can be used in electronic, radio engineering, aviation, rocket and other industries. The main areas of application are the technological processes of annealing, quenching, degassing and sintering.

Vacuum chambers can be used: for drying materials (low vacuum), testing spacecraft, during experiments on plasma retention and antimatter production, as elements of charged particle accelerator systems and systems for applying thin films. Vacuum chambers can be used: for drying materials (low vacuum), testing spacecraft, during experiments on plasma retention and antimatter production, as elements of charged particle accelerator systems and systems for applying thin films.

Vacuum valves are designed to cut off and seal the elements of the vacuum system, thereby, vacuum valves provide the necessary sequence of pumping and air intake. The vacuum valves presented in this section are mass-produced by NPO Helikon.

Ampoules with certified solutions (AS) contain solutions of a number of substances with a certified concentration. AS are designed for independent preparation by the consumer of certified combined-cycle gas mixtures while monitoring the quality of measurement results and the stability of calibration data. The use of AS for this purpose is prescribed in the methods of analysis FR.1.31.2014.17787, FR.1.31.2014.17955, FR.1.31.2015.20512, FR.1.31.2015.21296, FR.1.31.2016.23707, FR..1.31.2016.23997 and FR.1.31.2016.239967 for FGH chromatographs.